Jump to content

Specific Process Knowledge/Lithography/Strip: Difference between revisions

← Older editNewer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,527 edits
Line 6: Line 6:
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Plasma Asher 1|Plasma Asher 1]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Plasma Asher 1|Plasma Asher 1]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Plasma Asher 1|Plasma Asher 1]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Plasma Asher 2|Plasma Asher 2]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#III-V Plasma Asher|III-V Plasma Asher]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#III-V Plasma Asher|III-V Plasma Asher]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Rough Acetone Strip|Rough Acetone Strip]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Rough Acetone Strip|Rough Acetone Strip]]</b>
Line 21: Line 21:
*III-V materials only
*III-V materials only
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*
*Resist strip
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*
*Resist strip


|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance
!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Method
|style="background:LightGrey; color:black"|Minimum feature size
|style="background:LightGrey; color:black"|Minimum feature size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Line 34: Line 34:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*
*
|style="background:WhiteSmoke; color:black"|
*
|style="background:WhiteSmoke; color:black"|
*
|-
|style="background:LightGrey; color:black"|Exposure light/filters/spectrum
|style="background:WhiteSmoke; color:black"|
*
|style="background:WhiteSmoke; color:black"|
*
|style="background:WhiteSmoke; color:black"|
*
|style="background:WhiteSmoke; color:black"|
*
|style="background:WhiteSmoke; color:black"|
*
|-
|style="background:LightGrey; color:black"|Exposure mode
|style="background:WhiteSmoke; color:black"|
*
|style="background:WhiteSmoke; color:black"|
*
|style="background:WhiteSmoke; color:black"|
*
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*
*
Line 96: Line 70:
|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*<nowiki>1</nowiki> small samples
*1 small sample
*<nowiki>1</nowiki> 50 mm wafers
*1 50 mm wafer
*<nowiki>1</nowiki> 100 mm wafers
*1 - 30 100 mm wafers
*<nowiki>1</nowiki> 150 mm wafers
*1 - 30 150 mm wafers
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*<nowiki>1</nowiki> 50 mm wafers
*1 small sample
*<nowiki>1</nowiki> 100 mm wafers
*1 50 mm wafer
*<nowiki>25</nowiki> 150 mm wafers with automatic handling
*1 - 30 100 mm wafers
*1 - 30 150 mm wafers
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*<nowiki>1</nowiki> small samples
*1 small sample
*<nowiki>1</nowiki> 50 mm wafers
*1 50 mm wafer
*<nowiki>1</nowiki> 100 mm wafers
*1 100 mm wafer
*<nowiki>1</nowiki> 150 mm wafers
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*
*1 - 25 100 mm wafers
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*
*1 - 25 100 mm wafers


|-
|-
Line 119: Line 93:
*Si and silicon oxide, silicon nitride  
*Si and silicon oxide, silicon nitride  
*Quartz, pyrex
*Quartz, pyrex
*Metal patterning
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*No metal!
*Si and silicon oxide, silicon nitride  
*Si and silicon oxide, silicon nitride  
*Quartz, pyrex
*Quartz, pyrex
Line 125: Line 101:
*III-V compounds
*III-V compounds
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*
*Si and silicon oxide, silicon nitride
*Quartz, pyrex
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*
*Si and silicon oxide, silicon nitride
*Quartz, pyrex
|-  
|-  
|}
|}
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Strip"