Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
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|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |style="background:WhiteSmoke; color:black" align="center" colspan="2"| | ||
hexamethyldisilizane | hexamethyldisilizane (HMDS) | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="1"|Performance | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | ||
|style="background:LightGrey; color:black"|Process temperature | |style="background:LightGrey; color:black"|Process temperature | ||
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150°C | |||
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50°C | 50°C | ||
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|style="background:LightGrey; color:black"|Process time | |style="background:LightGrey; color:black"|Process time | ||
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32.5 min / batch | |||
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3 min / wafer | 3 min / wafer | ||
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