Specific Process Knowledge/Etch/Wet Silicon Nitride Etch: Difference between revisions
New page: ==Wet Silicon Nitride Etch== 300x300px|thumb|Wet nitride etch: positioned in cleanroom 4 |
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==Wet Silicon Nitride Etch== | ==Wet Silicon Nitride Etch== | ||
[[Image:Wet_nitride_etch.JPG|300x300px|thumb|Wet nitride etch: positioned in cleanroom 4]] | [[Image:Wet_nitride_etch.JPG|300x300px|thumb|Wet nitride etch: positioned in cleanroom 4]] | ||
solution: H3PO4 (85 wt%) | |||
Revision as of 09:58, 15 January 2008
Wet Silicon Nitride Etch
solution: H3PO4 (85 wt%)