Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

Revision as of 15:36, 3 February 2014 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,528 edits →HMDS on Spin Track 1 + 2 ← Older edit		Revision as of 15:39, 3 February 2014 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,528 edits →Process information Newer edit →
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	'''Baseline prime process description:'''		'''Baseline prime process description:'''

	1. Vacuum, 2 min		1. Vacuum, 2 min