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Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch): Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,304 edits
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|style="background:LightGrey; color:black"|Etch rates
|style="background:LightGrey; color:black"|Etch rates
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
~0.2-0.6 µm/min
~0.5-0.6 µm/min
|-
|-
|style="background:LightGrey; color:black"|Anisotropy
|style="background:LightGrey; color:black"|Anisotropy
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