Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch): Difference between revisions
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[[Image:AOE.jpg|300x300px|thumb|AOE: positioned in cleanroom B-1]] | [[Image:AOE.jpg|300x300px|thumb|AOE: positioned in cleanroom B-1]] | ||
The AOE can be used for etching silicon oxide, silicon (oxy)nitride and quartz. Look in the manuals for the AOE to see how to operate the machine (you can find the manuals in LabManager on the AOE page). | The AOE can be used for dry etching silicon oxide, silicon (oxy)nitride and quartz. Look in the manuals for the AOE to see how to operate the machine (you can find the manuals in LabManager on the AOE page). | ||
'''The user manual, quality control procedure and results, user APV, technical information and contact information can be found in LabManager:''' | |||
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[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=326 AOE in LabManager] | |||
== Process information == | == Process information == | ||