Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
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=HMDS= | =HMDS= | ||
'''Feedback to this section''': '''[mailto:photolith@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Pretreatment#HMDS click here]''' | |||
The chemical treatment with hexamethyldisilazane (HMDS) before the spin coating can be used to promote the adhesion for photoresist. HMDS treatment leaves a coating of TMS (trimethylsilyl) on the Si or SiO<sub>2</sub> surface. | The chemical treatment with hexamethyldisilazane (HMDS) before the spin coating can be used to promote the adhesion for photoresist. HMDS treatment leaves a coating of TMS (trimethylsilyl) on the Si or SiO<sub>2</sub> surface. | ||