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Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
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[[Image:HMDS1.JPG|300x300px|thumb|The HMDS oven is placed in Cleanroom 3.]]
[[Image:HMDS1.JPG|300x300px|thumb|The HMDS oven is placed in Cleanroom 3.]]


At Danchip we use Star2000 model from IMTEC to do prime vapor deposition of hexamethyldisilizane(HMDS)under the special conditions: low pressure and hight chamber tempurature. The result of the dehydration bake and HMDS prime is that the wafers become hydrophobic after the treatment.  
At Danchip we use Star2000 model from IMTEC to do prime vapor deposition of hexamethyldisilizane (HMDS) under the special conditions: low pressure and high chamber temperature. The result of the dehydration bake and HMDS prime is that the wafers become hydrophobic after the treatment.  


'''The user manual, user APV, and contact information can be found in LabManager:'''
'''The user manual, user APV, and contact information can be found in LabManager:'''
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