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Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

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The ICP Metal Etcher allows you to dry etch a small set of metals that includes aluminium, titanium, chromium, titanium tungsten and molybdenum (along with the related oxides and nitrides). It is, despite its name, strictly forbidden to etch (or expose to plasma) other metals. In order to do so use the [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab 300]].
The ICP Metal Etcher allows you to dry etch a small set of metals that includes aluminium, titanium, chromium, titanium tungsten and molybdenum (along with the related oxides and nitrides). It is, despite its name, strictly forbidden to etch (or expose to plasma) other metals. In order to do so use the [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab 300]].


'''The user manual, user APV, technical information and contact information can be found in LabManager:'''
'''The user manual, user APV and contact information can be found in LabManager:'''


Equipment info in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=266 LabManager]
Equipment info in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=266 LabManager]
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher"