Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions
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Lift off should never be done in the normal lift off bath in RR4 it should always be done in the dedicated lift off bath opposite the sputter. | Lift off should never be done in the normal lift off bath in RR4 it should always be done in the dedicated lift off bath opposite the sputter. | ||
'''The user manual, user APV and contact information can be found in LabManager:''' | |||
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[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=244 Sputter-System(Lesker) in LabManager] | |||
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Contact the pvd-group if you have special needs (pvd@danchip.dtu.dk). | Contact the pvd-group if you have special needs (pvd@danchip.dtu.dk). | ||
==Overview of the performance of Sputter-System(Lesker) and some process related parameters== | ==Overview of the performance of Sputter-System(Lesker) and some process related parameters== | ||