Specific Process Knowledge/Thin film deposition/Deposition of NiV: Difference between revisions
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Revision as of 15:02, 28 January 2014
NickelVanadium can be deposited by sputter evaporation. In the chart below you can compare the different deposition equipment.
| Sputter deposition (PVD co-sputter/evaporation) | Sputter deposition (Sputter-System Lesker) | |
|---|---|---|
| Batch size |
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| Pre-clean | RF Ar clean | |
| Layer thickness | About 10Å to 4000Å | . |
| Deposition rate | Depending on process parameters. | Depending on process parameters. |
| Allowed materials |
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| Comment |