Specific Process Knowledge/Characterization/XPS/XPS Depth profiling: Difference between revisions
No edit summary |
|||
| Line 1: | Line 1: | ||
=Depth profiling= | =Depth profiling= | ||
[[Image:Stochiometry 20110510.JPG| | [[Image:Stochiometry 20110510.JPG|600x600px|left|thumb|The composition of a NiCr as a function of film depth (etch time). The relationship between Cr and Ni is quite constant through the 70nm thick film. Measurements done with XPS-ThermoScientific. ]] | ||
The analysis is made on a chosen spot on the sample surface (chosen with the system camera). The technique is, as written above, very surface sensitive and probes only the top nanometers of the sample. | The analysis is made on a chosen spot on the sample surface (chosen with the system camera). The technique is, as written above, very surface sensitive and probes only the top nanometers of the sample. | ||