Specific Process Knowledge/Characterization/XPS: Difference between revisions
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==XPS-ThermoScientific== | ==XPS-ThermoScientific== | ||
[[image:XPS instrument2.JPG|300x300px|right|thumb|The XPS system placed at Danchip (room 904, building 346).]] | [[image:XPS instrument2.JPG|300x300px|right|thumb|The XPS system placed at Danchip (room 904, building 346).]] | ||
A X-ray Photoelectron Spectroscopy (XPS) system can be used at Danchip. The system is a Thermo K-Alpha system, placed in the basement of building 346. | A X-ray Photoelectron Spectroscopy (XPS) system can be used at Danchip. The system is a Thermo K-Alpha system, placed in the basement of building 346. | ||
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[http://http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS-ThermoScientific in LabManager] | [http://http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS-ThermoScientific in LabManager] | ||
The XPS technique can be used to do elemental analysis. | |||
The XPS technique can be used to do elemental analysis, chemical state analysis on the sample surface or do a depth profiling. See more about the different possibilities here: | |||
*[[Specific Process Knowledge/Characterization/XPS/XPS technique|XPS technique]] | *[[Specific Process Knowledge/Characterization/XPS/XPS technique|XPS technique]] | ||
*[[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Elemental composition analysis]] | *[[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Elemental composition analysis]] | ||