Specific Process Knowledge/Wafer cleaning/IMEC: Difference between revisions
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!Comments | !Comments | ||
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| Pre bonding cleaning of Si wafers with cavities and SOI wafers with nitride | | Pre bonding cleaning of Si wafers with cavities and SOI wafers with nitride | ||
| | | | ||
|Use wafers with | |Use wafers with cavities on and SOI wafers | ||
Takes 1½ hours | *Takes 1½ hours | ||
Orient flat to minimize handling | *Orient flat to minimize handling | ||
Preferable done just before bonding! | *Preferable done just before bonding! | ||
|Get CLEAN box for wafers!!! | |Get CLEAN box for wafers!!! | ||
|- | |- | ||
| | |2 | ||
|Piranha | |Piranha | ||
|Mixture: H2SO4:H2O2 (4:1) | |Mixture: H2SO4:H2O2 (4:1) | ||
Temp: 80 | Temp: 80 <sup>o</sup>C | ||
Time: 5 min | Time: 5 min | ||
( | (a yellow and a black spot) | ||
|Clean tank (cleanroom 4) and make your own or make in dedicated glass. | |Clean tank (cleanroom 4) and make your own or make in dedicated glass. | ||
Pour up H2SO4 first, put wafers in carrier (USE this in steps4.1-4.6), add H2O2, wait 30 sec, dip wafers. | Pour up H2SO4 first, put wafers in carrier (USE this in steps4.1-4.6), add H2O2, wait 30 sec, dip wafers. | ||
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Put into dedicated wet box for IMEC | Put into dedicated wet box for IMEC | ||
|- | |- | ||
| | |3 | ||
|Rinse | |Rinse | ||
|2 min rinse | |2 min. rinse | ||
| | | | ||
|Put into dedicated wet box for IMEC | |Put into dedicated wet box for IMEC | ||
|- | |- | ||
|4 | |4 | ||
|IMEC | |IMEC | ||
|DI water:5% HF:isopropanol (100:10:1) | |DI water:5% HF:isopropanol (100:10:1) | ||
Temp: 25 | Temp: 25 <sup>o</sup>C | ||
Time: 100 sec | Time: 100 sec | ||
( | (two black spots) | ||
|Clean tank (cleanroom 4) and make your own, it needs 2 bottles | |Clean tank (cleanroom 4) and make your own, it needs 2 bottles | ||
Bottles are in service room 2 on the left, pump is by Leica microscope in cleanroom 3 | |||
|Bottle for mixing is in service room 2, use | |Bottle for mixing is in service room 2, use BHF pump from RCA fumehood! | ||
Put into dedicated wet box for IMEC | Put into dedicated wet box for IMEC | ||
|- | |- | ||
| | |5 | ||
|Rinse | |Rinse | ||
|2 min rinse | |2 min. rinse | ||
| | | | ||
| | | | ||
|- | |- | ||
| | |6 | ||
|Piranha | |Piranha | ||
|Not nitride wafers! | |Not nitride wafers! | ||
Mixture: H2SO4:H2O2 (4:1) | Mixture: H2SO4:H2O2 (4:1) | ||
Temp: 80 | Temp: 80 <sup>o</sup>C | ||
Time: 20 min | Time: 20 min | ||
| | |Re-use previous piranha | ||
Makes wafers | Makes wafers hydrophilic | ||
|Put into dedicated wet box for IMEC | |Put into dedicated wet box for IMEC | ||
|- | |- | ||
| | |7 | ||
|Rinse & spin dry | |Rinse & spin dry | ||
|5 min rinse | |5 min rinse | ||
| Line 72: | Line 72: | ||
|Put into dedicated wet box for IMEC | |Put into dedicated wet box for IMEC | ||
|- | |- | ||
| | |8 | ||
|Put wafers in new clean carrier box | |Put wafers in new clean carrier box | ||
| | | | ||
Revision as of 08:43, 15 January 2008
Ikke godkendt
IMEC process for cleaning of wafers before fusion bonding:
| Step | Process | Details | Comments | Comments |
|---|---|---|---|---|
| 1 | Pre bonding cleaning of Si wafers with cavities and SOI wafers with nitride | Use wafers with cavities on and SOI wafers
|
Get CLEAN box for wafers!!! | |
| 2 | Piranha | Mixture: H2SO4:H2O2 (4:1)
Temp: 80 oC Time: 5 min (a yellow and a black spot) |
Clean tank (cleanroom 4) and make your own or make in dedicated glass.
Pour up H2SO4 first, put wafers in carrier (USE this in steps4.1-4.6), add H2O2, wait 30 sec, dip wafers. |
Maybe clean the tank the day before!
Put into dedicated wet box for IMEC |
| 3 | Rinse | 2 min. rinse | Put into dedicated wet box for IMEC | |
| 4 | IMEC | DI water:5% HF:isopropanol (100:10:1)
Temp: 25 oC Time: 100 sec (two black spots) |
Clean tank (cleanroom 4) and make your own, it needs 2 bottles
Bottles are in service room 2 on the left, pump is by Leica microscope in cleanroom 3 |
Bottle for mixing is in service room 2, use BHF pump from RCA fumehood!
Put into dedicated wet box for IMEC |
| 5 | Rinse | 2 min. rinse | ||
| 6 | Piranha | Not nitride wafers!
Mixture: H2SO4:H2O2 (4:1) Temp: 80 oC Time: 20 min |
Re-use previous piranha
Makes wafers hydrophilic |
Put into dedicated wet box for IMEC |
| 7 | Rinse & spin dry | 5 min rinse | Put into dedicated wet box for IMEC | |
| 8 | Put wafers in new clean carrier box |