Specific Process Knowledge/Characterization/SIMS: Secondary Ion Mass Spectrometry: Difference between revisions
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[[Image:Equipment_SIMS.jpg|300x300px|thumb|Atomika SIMS: positioned in the basement of building 346 (underneath the cleanroom).]] | [[Image:Equipment_SIMS.jpg|300x300px|thumb|Atomika SIMS: positioned in the basement of building 346 (underneath the cleanroom).]] | ||
The Atomika SIMS analyses the composition of a sample by secondary ion mass spectroscopy. By using either oxygen or cesium ions accelerated by a high tension the surface of the sample is sputtered off as ions. These ions are analysed in a mass spectrometer and one can determine the elemental composition as a function of depth. If compared to signals from reference materials one can quantify the atomic composition - in certain cases down to extremely low concentrations (ppm). Doping levels and impurities may be determined. | The Atomika SIMS analyses the composition of a sample by secondary ion mass spectroscopy. By using either oxygen or cesium ions accelerated by a high tension the surface of the sample is sputtered off as ions. These ions are analysed in a mass spectrometer and one can determine the elemental composition as a function of depth. If compared to signals from reference materials one can quantify the atomic composition - in certain cases down to extremely low concentrations (ppm). Doping levels and impurities may be determined. | ||
Please note that no user will be instructed on the SIMS. Danchip staff will run your samples. | Please note that no user will be instructed on the SIMS. Danchip staff will run your samples. | ||
'''The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:''' | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&page_id=169 The Atomika SIMS in Labmanager] | |||
==An overview of the performance of the SIMS== | ==An overview of the performance of the SIMS== |
Revision as of 13:32, 24 January 2014
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Atomika SIMS
The Atomika SIMS analyses the composition of a sample by secondary ion mass spectroscopy. By using either oxygen or cesium ions accelerated by a high tension the surface of the sample is sputtered off as ions. These ions are analysed in a mass spectrometer and one can determine the elemental composition as a function of depth. If compared to signals from reference materials one can quantify the atomic composition - in certain cases down to extremely low concentrations (ppm). Doping levels and impurities may be determined.
Please note that no user will be instructed on the SIMS. Danchip staff will run your samples.
The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:
The Atomika SIMS in Labmanager
An overview of the performance of the SIMS
Purpose | Determination of atomic composition |
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Performance | Measurement accuracy depends on |
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Process parameters |
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Sample requirements | Substrate material allowed |
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Substrate size |
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Batch size |
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