Specific Process Knowledge/Characterization/SIMS: Secondary Ion Mass Spectrometry: Difference between revisions
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[[Image:Equipment_SIMS.jpg|300x300px|thumb|Atomika SIMS: positioned in the basement of building 346 (underneath the cleanroom).]] | [[Image:Equipment_SIMS.jpg|300x300px|thumb|Atomika SIMS: positioned in the basement of building 346 (underneath the cleanroom).]] | ||
The Atomika SIMS analyses the composition of a sample by secondary ion mass spectroscopy. By using either oxygen or cesium ions accelerated by a high tension the surface of the sample is sputtered off as ions. These ions are analysed in a mass spectrometer and one can determine the elemental composition as a function of depth. If compared to signals from reference materials one can quantify the atomic composition - in certain cases down to extremely low concentrations (ppm). Doping levels and impurities may be determined. | The Atomika SIMS analyses the composition of a sample by secondary ion mass spectroscopy. By using either oxygen or cesium ions accelerated by a high tension the surface of the sample is sputtered off as ions. These ions are analysed in a mass spectrometer and one can determine the elemental composition as a function of depth. If compared to signals from reference materials one can quantify the atomic composition - in certain cases down to extremely low concentrations (ppm). Doping levels and impurities may be determined. | ||
Please note that no user will be instructed on the SIMS. Danchip staff will run your samples. | Please note that no user will be instructed on the SIMS. Danchip staff will run your samples. | ||
'''The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:''' | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&page_id=169 The Atomika SIMS in Labmanager] | |||
==An overview of the performance of the SIMS== | ==An overview of the performance of the SIMS== | ||