Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
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110° (water) | 110° (water) | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan=" | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters | ||
|style="background:LightGrey; color:black"|Base pressure | |||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |||
20 mTorr | |||
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|style="background:LightGrey; color:black"|Chamber temperature | |style="background:LightGrey; color:black"|Chamber temperature | ||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |style="background:WhiteSmoke; color:black" align="center" colspan="2"| | ||