Specific Process Knowledge/Characterization/Thickness Measurer: Difference between revisions

From LabAdviser
Mdyma (talk | contribs)
Mdyma (talk | contribs)
No edit summary
Line 5: Line 5:


==Thickness measurer==
==Thickness measurer==
[[Image:Thicknessmeasurer2007.jpg|thumb|300x300px|Thickness meassurer. Positioned in cleanroom 4]]
[[Image:Thicknessmeasurer2007.jpg|thumb|300x300px|Digital Thickness Measurer. Positioned in cleanroom 4]]


The purpose is to measure the thickness of wafers, depths of larger grooves or height of larger mesas.  
The purpose is to measure the thickness of wafers, depths of larger grooves or height of larger mesas.  


Doing a KOH etch can it be helpful to insure no over etching by making a thickness measurement doing the etch.
Doing a KOH etch can it be helpful to insure no over etching by making a thickness measurement doing the etch.
We have two Thickness measures an analog and a digital one.


'''The user manual, technical information and contact information can be found in LabManager:'''
'''The user manual, technical information and contact information can be found in LabManager:'''
Line 21: Line 19:
|bgcolor="#98FB98" |'''Quality Control (QC) for the Thickness measurer'''
|bgcolor="#98FB98" |'''Quality Control (QC) for the Thickness measurer'''
|-
|-
|
|  
The measured standard thickness is 0.1 mm. The measured result have to be within ± 0.005 mm. The QC is preformed ones a year.
*[http://www.labmanager.danchip.dtu.dk/d4Show.php?id=1831&mach=198 The QC procedure]<br>
*[http://www.labmanager.danchip.dtu.dk/d4Show.php?id=1831&mach=198 The QC procedure]<br>
*[http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=2062 The newest QC data]<br>
*[http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=2062 The newest QC data]<br>
The measured standard thickness is 0.1 mm. The measured result have to be within +- 0.005 mm. The QC is preformed ones a year.
|}
|}


==Equipment performance and process related parameters==
==Equipment performance and process related parameters==


{| border="2" cellspacing="2" cellpadding="0"  
{| border="2" cellspacing="2" cellpadding="3"  
 
|-
|-
!style="background:silver; color:black;" align="center"|
!style="background:silver; color:black;" align="center"|
Line 71: Line 69:
|-  
|-  
|}
|}
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Thickness_Measurer click here]'''
This is a micrometer-screw.
[[image:Mikrometerskrue_hel_a.JPG|200x200px|right|thumb|The Thickness measurer in Cleanroom 3 ]]
It measures with an accurracy within a few µm.
The range is from a few µm up to 5mm.
Measure the wafer in the box next to the meter. If this is ok, then other wafers can be measured.
There is a calibration device by the DEKTAK.
It is calibrated at 750µm.

Revision as of 14:39, 14 January 2014

THIS PAGE IS UNDER CONSTRUCTION

Feedback to this page: click here

Thickness measurer

Digital Thickness Measurer. Positioned in cleanroom 4

The purpose is to measure the thickness of wafers, depths of larger grooves or height of larger mesas.

Doing a KOH etch can it be helpful to insure no over etching by making a thickness measurement doing the etch.

The user manual, technical information and contact information can be found in LabManager:

Thickness measurer

Quality Control - Recipe Parameters and Limits

Quality Control (QC) for the Thickness measurer

The measured standard thickness is 0.1 mm. The measured result have to be within ± 0.005 mm. The QC is preformed ones a year.

Equipment performance and process related parameters

Purpose

Thickness measurer

  • Wafer
  • Depths of larger grooves
  • Heigth of larger mesas

Performance

Thickness resolution

  • >5 µm

Process parameter range

Process Temperature

  • Room temperature
Process pressure
  • 1 atm

Substrates

Batch size

  • One sample
Substrate materials allowed
  • No restriction.