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==Apox furnace (D1)==
==Apox furnace (D1)==
[[Image:APOX.JPG|thumb|300x300px|D1 Furnace Apox: positioned in cleanroom ?]]
[[Image:APOX.JPG|thumb|300x300px|Apox furnace (D1): positioned in the III-V cleanroom area]]


The APOX furnace (D1) is a Tempress horizontal furnace for oxidation silicon wafers. This furnace is dedicated for oxidation of new and clean Si wafers to form apox layers which is a very thick wet thermal oxide grown at 1150 <sup>o</sup>C. Running a batch of apox wafers (oxide>5µm) can take several weeks, depending on how thick an apox layer that is required.   
The APOX furnace (D1) is a Tempress horizontal furnace for oxidation silicon wafers. This furnace is dedicated for oxidation of new and clean Si wafers to form apox layers which is a very thick wet thermal oxide grown at 1150 <sup>o</sup>C. Running a batch of apox wafers (oxide thickness > 5µm) can take several weeks, depending on how thick an apox layer that is required.   


This furnace is positioned in III-V cleanroom. Only Danchip employees are allowed to use the furnace.
This furnace is positioned in the III-V cleanroom area. Only Danchip employees are allowed to operate the furnace.


==Process knowledge==
==Process knowledge==
*Oxidation: look at the [[Specific Process Knowledge/Thermal Process/Oxidation|Oxidation]] page
*Oxidation: look at the [[Specific Process Knowledge/Thermal Process/Oxidation|Oxidation]] page


==Overview of the performance of Apox furnace and some process related parameters==
==Overview of the performance of the Apox furnace and some process related parameters==


{| border="2" cellspacing="0" cellpadding="2"  
{| border="2" cellspacing="0" cellpadding="2"  
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|style="background:LightGrey; color:black"|Film thickness
|style="background:LightGrey; color:black"|Film thickness
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Wet SiO<sub>2</sub>: Thicker than > 5 µm (APOX layers)
*Wet oxide: Thicker than > 5 µm (APOX layers)
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameter range
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameter range
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