Specific Process Knowledge/Thermal Process/Furnace APOX: Difference between revisions

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 ==Overview of the performance of Apox furnace and some process related parameters==
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 !style="background:silver; color:black;" align="center"|Purpose
-|style="background:LightGrey; color:black"|Oxidation and annealing
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+Oxidation and annealing
 |style="background:WhiteSmoke; color:black"|Oxidation:
-*Wet: with bubbler (water steam + N<sub>2</sub>)
+*Wet: With bubbler (water steam + N<sub>2</sub>)
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 !style="background:silver; color:black" align="center"|Performance
 |style="background:LightGrey; color:black"|Film thickness
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-*Wet SiO<sub>2</sub>: used for layer thickness >5µm
+*Wet SiO<sub>2</sub>: Thicker than > 5 µm (APOX layers)
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 !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameter range
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 |style="background:LightGrey; color:black"|Gas flows
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-*N<sub>2</sub>:5 sccm
+*N<sub>2</sub>: 5 sccm
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 !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates