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==Noble furnace==
==Noble furnace==
'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_Noble click here]'''
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The Noble Furnace is mostlys used for annealing and oxidation of different samples. Also more dirty samples with metal are allowed in the furnace.
The maximum temperature of the Noble furnace is 1000 <sup>o</sup>C. The gas connections are N<sub>2</sub>, O<sub>2</sub> and argon. Recently (Autumn 2013) a bubler for wet oxidaton has also been installed on the furnace.
The furnace is located in in service area 3.




This furnace is used to grow oxide on metals or dirty wafers and to anneal wafers up to 1000 degree Celsius.
This furnace is used to grow oxide on metals or dirty wafers and to anneal wafers up to 1000 degree Celsius.
The Noble furnace is located in service room 3.
 


[[Image:Noble.JPG|thumb|300x300px|A1 Bor Drive-in furnace. Positioned in cleanroom 2]]
[[Image:Noble.JPG|thumb|300x300px|A1 Bor Drive-in furnace. Positioned in cleanroom 2]]
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|style="background:LightGrey; color:black"|Gasses on the system
|style="background:LightGrey; color:black"|Gasses on the system
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*N<sub>2</sub>:0-5 sccm
*N<sub>2</sub>:0-5 SLM
*O<sub>2</sub>: 0-5 sccm
*O<sub>2</sub>: 0-5 SLM
*Argon: 0-7 SLM
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates