Specific Process Knowledge/Thermal Process/Furnace Noble: Difference between revisions
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==Noble furnace== | ==Noble furnace== | ||
'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_Noble click here]''' | '''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_Noble click here]''' | ||
The Noble Furnace is mostlys used for annealing and oxidation of different samples. Also more dirty samples with metal are allowed in the furnace. | |||
The maximum temperature of the Noble furnace is 1000 <sup>o</sup>C. The gas connections are N<sub>2</sub>, O<sub>2</sub> and argon. Recently (Autumn 2013) a bubler for wet oxidaton has also been installed on the furnace. | |||
The furnace is located in in service area 3. | |||
This furnace is used to grow oxide on metals or dirty wafers and to anneal wafers up to 1000 degree Celsius. | This furnace is used to grow oxide on metals or dirty wafers and to anneal wafers up to 1000 degree Celsius. | ||
[[Image:Noble.JPG|thumb|300x300px|A1 Bor Drive-in furnace. Positioned in cleanroom 2]] | [[Image:Noble.JPG|thumb|300x300px|A1 Bor Drive-in furnace. Positioned in cleanroom 2]] | ||
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|style="background:LightGrey; color:black"|Gasses on the system | |style="background:LightGrey; color:black"|Gasses on the system | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*N<sub>2</sub>:0-5 | *N<sub>2</sub>:0-5 SLM | ||
*O<sub>2</sub>: 0-5 | *O<sub>2</sub>: 0-5 SLM | ||
*Argon: 0-7 SLM | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates | ||