Specific Process Knowledge/Characterization/Profiler: Difference between revisions
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{| border="2" cellspacing="0" cellpadding="10" | {| border="2" cellspacing="0" cellpadding="10" | ||
!colspan="2" border="none" style="background:silver; color:black;" align="center"|<b>Equipment</b> | |||
|style="background:WhiteSmoke; color:black"|<b>Optical profiler</b> | |||
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!style="background:silver; color:black;" align="left"|Purpose | !style="background:silver; color:black;" align="left"|Purpose | ||
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!style="background:silver; color:black;" align="left"|Posibilities | !style="background:silver; color:black;" align="left"|Posibilities | ||
|style="background:LightGrey; color:black"|Confocal and interferometric profiling and reflectometry||style="background:WhiteSmoke; color:black"| | |style="background:LightGrey; color:black"|Confocal and interferometric profiling and reflectometry||style="background:WhiteSmoke; color:black"| | ||
* | *Standard microscope imaging | ||
* | *Confocal imaging | ||
* | *Confocal profiling | ||
*PSI (Phase Shift Interferometry) | *PSI (Phase Shift Interferometry) | ||
*VSI (Vertical Scanning Interferometry) | *VSI (Vertical Scanning Interferometry) | ||
* | *High resolution thin film thickness measurement using reflectrometry | ||
* | *Wafer mapping | ||
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!style="background:silver; color:black" align="left"|Performance | !style="background:silver; color:black" align="left"|Performance | ||
|style="background:LightGrey; color:black"|Depending on the objective chosen||style="background:WhiteSmoke; color:black"| | |style="background:LightGrey; color:black"|Depending on the objective chosen||style="background:WhiteSmoke; color:black"| | ||
* | *See the performance of the different objectives here: [[image:Optical_Profiler_Table_2.jpg|27x27px|center|thumb]] | ||
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|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
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* | *Up to more than 150 mm wafers | ||
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