Specific Process Knowledge/Characterization/Thickness Measurer: Difference between revisions

@@ Line 16: / Line 16: @@
 ==Process knowledge==
+==Quality Control - Recipe Parameters and Limits==
+{| border="1" cellspacing="2" cellpadding="2" colspan="3"
+|bgcolor="#98FB98" |'''Quality Control (QC) for the Thickness measurer'''
+|-
+|
+*[http://www.labmanager.danchip.dtu.dk/d4Show.php?id=1831&mach=198 The QC procedure]<br>
+*[http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=2062 The newest QC data]<br>
+{| {{table}}
+| align="center" |
+{| border="1" cellspacing="1" cellpadding="2"  align="center" style="width:200px"
+! QC Recipe:
+! Wet1050
+! Dry1050
+|-
+| H<sub>2</sub> flow
+|3 sccm
+|0 sccm
+|-
+|O<sub>2</sub> flow
+|2 sccm
+|5 sccm
+|-
+|Temperature
+|1050 C
+|1050 C
+|-
+|Oxidation time
+|30 min
+|100 min
+|-
+|}
+| align="center" valign="top"|
+{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:500px"
+!QC limits
+|Thickness
+|Non-uniformity (both over a single wafer
+and over the boat)
+|-
+!Dry1050
+|110-116 nm
+|3 %
+|-
+!Wet1050
+|305-321 nm
+|5 %
+|-
+|}
+|-
+|}
+|}