Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
No edit summary |
|||
| Line 26: | Line 26: | ||
|Jeol JSM 5500 LV SEM | |Jeol JSM 5500 LV SEM | ||
|- | |- | ||
| | |Electron emitter type | ||
| | |FEG (Field Emission Gun) | ||
| | |FEG (Field Emission Gun) | ||
|Tungsten filament | |||
|- | |||
|EDX analysis | |||
|Oxford Inca system | |||
|R\"ontec system | |||
|Not available | |||
|- | |||
|Vacuum modes | |||
|High vacuum (>2*10<math>^{-4}</math>mbar) and Low vacuum (0.1-1.9 mbar) | |||
|High vacuum (>2*10<math>^{-5}</math>mbar) | |||
|High vacuum and Low vacuum | |||
|- | |- | ||
|Substrate size | |Substrate size | ||
|Up to 6" with full view | |Up to 6" wafer with full view | ||
|Up to 6" with 4" full view | |Up to 6" wafer with 4" full view | ||
|Up to 4" with full view | |Up to 4" wafer with full view | ||
|- | |- | ||
| | |Additional equipment | ||
| | |Kleindiek micromanipulator with Capres 4 point probe | ||
| | | | ||
| | | | ||
|- | |- | ||
| | |Best obtainable lateral resolution (strongly dependent on user skills and sample type) | ||
| | |Down to 1-2 nm | ||
| | |Down to 10 nm | ||
| | |Down to 20-30 nm | ||
|- | |- | ||
|General availability | |General availability | ||
| Line 51: | Line 62: | ||
|- | |- | ||
|Ease of use | |Ease of use | ||
| | |A sophisticated user interface with many features and many different detectors: Complicated | ||
| | |A simple user interface with joystick and a limited number of detectors: Relatively simple | ||
| | |A simple user interface with joystick with one detector: Very simple | ||
|- | |- | ||
|Best usage | |Best usage | ||