Specific Process Knowledge/Thermal Process/C4 Aluminium Anneal furnace: Difference between revisions

@@ Line 21: / Line 21: @@
 !style="background:silver; color:black;" align="center"|Purpose
 |style="background:LightGrey; color:black"|Annealing
-|style="background:WhiteSmoke; color:black"|Annealing of wafers containing aluminium.
+|style="background:WhiteSmoke; color:black"|
+*Annealing of wafers with aluminium
+*Oxidation of wafers with aluminium
 |-
 !style="background:silver; color:black" align="center"|Performance
@@ Line 44: / Line 46: @@
 |style="background:LightGrey; color:black"|Batch size
 |style="background:WhiteSmoke; color:black"|
-*1-30 4" wafer (or 2" wafers)
+*1-30 100 mm wafers (or 50 mm wafers)
 |-
 | style="background:LightGrey; color:black"|Substrate material allowed