Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions
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==Aluminium deposition on ZEP520A for lift-off== | |||
This is a small study of which aluminium deposition that is best for aluminium lift-off on ZEP520A resist and a very thin layer of aluminium (~20nm). | |||
The conclusion was that e-beam evaporation of aluminium in the Alcatel at 15Å/s gave the best result. | |||
See details of the study [[/Aluminium deposition on ZEP520A for lift-off|here]] | |||