Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy: Difference between revisions

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 !style="background:silver; color:black;" align="left"|Purpose
 |style="background:LightGrey; color:black"|Topografic measurement in the nanometer and and sub-micron regime||style="background:WhiteSmoke; color:black"|
-*surface roughness measurement
+*Surface roughness measurement
-*step/structure hight measurement
+*Step/structure hight measurement
 *Surface image
 |-
 !style="background:silver; color:black" align="left"|Performance
 |style="background:LightGrey; color:black"|Scan range xy||style="background:WhiteSmoke; color:black"|
-up to 90 µm square
+Up to 90 µm square
 |-
 |style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Scan range z
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 |style="background:LightGrey; color:black"|Tip radius of curvature
 |style="background:WhiteSmoke; color:black"|
-*Standrad probe: <12 nm
+Standrad probe: <12 nm
 |-
 !style="background:silver; color:black" align="left"|Substrates
 |style="background:LightGrey; color:black"|Substrate size
 |style="background:WhiteSmoke; color:black"|
-*up to 6"
+Up to 6"
 |-
 |style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed
 |style="background:WhiteSmoke; color:black"|
-*In principle all materials
+In principle all materials
 |-
 |}