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Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy: Difference between revisions

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!style="background:silver; color:black;" align="left"|Purpose  
!style="background:silver; color:black;" align="left"|Purpose  
|style="background:LightGrey; color:black"|Profiler for measuring micro structures.||style="background:WhiteSmoke; color:black"|
|style="background:LightGrey; color:black"|Topografic measurement in the nanometer and and sub-micron regime||style="background:WhiteSmoke; color:black"|
*Single point profiles
*surface roughness measurement
*Wafer mapping
*step/structure hight measurement
*Stress measurements by measuring wafer bow
*Surface image
*Surface roughness on a line scan
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!style="background:silver; color:black" align="left"|Performance
!style="background:silver; color:black" align="left"|Performance
|style="background:LightGrey; color:black"|Scan range xy||style="background:WhiteSmoke; color:black"|
|style="background:LightGrey; color:black"|Scan range xy||style="background:WhiteSmoke; color:black"|
Line scan x: 50 µm to 200 mm
up to 90 µm square
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|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Scan range z
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Scan range z
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
50 Å to 262 µm
1 µm (can go up to 6µm with special settings)
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|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution xy
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution xy
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
down to 0.067 µm
Down to 1.4 nm - accuracy better than 2%
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|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution z
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution z
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
1Å, 10Å or 20Å
<1 Å - accuracy better than 2%
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|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
1.2(W[µm]-5µm)
~1 for our standard probe. Can be improved to about 10 with the right probe
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!style="background:silver; color:black" align="left"|Hardware settings
!style="background:silver; color:black" align="left"|Hardware settings
|style="background:LightGrey; color:black"|Tip radius
|style="background:LightGrey; color:black"|Tip radius of curvature
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*5 µm 45<sup>o</sup> cone
*Standrad probe: <12 nm
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!style="background:silver; color:black" align="left"|Substrates
!style="background:silver; color:black" align="left"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*up to 8"
*up to 6"
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|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed
|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed
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