Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions
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| RCA clean* Si wafers with no history of Metals on||x||x||x||x (with special permission)||x||.||x | | RCA clean* Si wafers with no history of Metals on||x||x||x||x (with special permission)||x||.||x | ||
|- | |- | ||
| From Predep furnace directly (e.g. incl. Predep HF*)||From | | From Predep furnace directly (e.g. incl. Predep HF*)||From A1||From A4||x||.||x||.||x | ||
|- | |- | ||
| Wafers directly from PECVD1||.||.||x||.||x||.||x | | Wafers directly from PECVD1||.||.||x||.||x||.||x | ||