Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy: Difference between revisions

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==Nanoman==
==Nanoman==
[[image:Dektak8.JPG|275x275px|right|thumb|Dektak8: positioned in cleanroom 4 - glass cage no. 4]]
The AFM: Nanoman is a product of Veeco Instruments.
To get some product information from the vendor take a look at Veeco's homepage [http://www.veeco.com/products/details.php?cat=1&sub=1&pid=178]
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===A rough overview of the performance of th eAFM: Nanoman===
{| border="2" cellspacing="0" cellpadding="10"
|-
!style="background:silver; color:black;" align="left"|Purpose
|style="background:LightGrey; color:black"|Profiler for measuring micro structures.||style="background:WhiteSmoke; color:black"|
*Single point profiles
*Wafer mapping
*Stress measurements by measuring wafer bow
*Surface roughness on a line scan
|-
!style="background:silver; color:black" align="left"|Performance
|style="background:LightGrey; color:black"|Scan range xy||style="background:WhiteSmoke; color:black"|
Line scan x: 50 µm to 200 mm
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Scan range z
|style="background:WhiteSmoke; color:black"|
50 Å to 262 µm
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution xy
|style="background:WhiteSmoke; color:black"|
down to 0.067 µm
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution z
|style="background:WhiteSmoke; color:black"|
1Å, 10Å or 20Å
|-
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W
|style="background:WhiteSmoke; color:black"|
1.2(W[µm]-5µm)
|-
|-
!style="background:silver; color:black" align="left"|Hardware settings
|style="background:LightGrey; color:black"|Tip radius
|style="background:WhiteSmoke; color:black"|
*5 µm 45<sup>o</sup> cone
|-
!style="background:silver; color:black" align="left"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
*up to 8"
|-
|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed
|style="background:WhiteSmoke; color:black"|
*In principle all materials
|-
|}
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Revision as of 11:39, 8 January 2008

Nanoman

Dektak8: positioned in cleanroom 4 - glass cage no. 4

The AFM: Nanoman is a product of Veeco Instruments.

To get some product information from the vendor take a look at Veeco's homepage [1]

A rough overview of the performance of th eAFM: Nanoman

Purpose Profiler for measuring micro structures.
  • Single point profiles
  • Wafer mapping
  • Stress measurements by measuring wafer bow
  • Surface roughness on a line scan
Performance Scan range xy

Line scan x: 50 µm to 200 mm

. Scan range z

50 Å to 262 µm

. Resolution xy

down to 0.067 µm

. Resolution z

1Å, 10Å or 20Å

. Max. scan depth as a function of trench width W

1.2(W[µm]-5µm)

Hardware settings Tip radius
  • 5 µm 45o cone
Substrates Substrate size
  • up to 8"
. Substrate material allowed
  • In principle all materials



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