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Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions

Pevo (talk | contribs)
Pevo (talk | contribs)
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|Samples have to be (semi)conducting, but may have a thin (> ~ 5 µm) layers of non-conducting materials on top.
|Samples have to be (semi)conducting, but may have a thin (> ~ 5 µm) layers of non-conducting materials on top.
:Non-conducting samples (thick polymer, qaurtz or glass samples) can be inspected in the FEI-SEM or one of the Supra-SEMs.
:Non-conducting samples (thick polymer, qaurtz or glass samples) can be inspected in the FEI-SEM or one of the Supra-SEMs.
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|Sample dimensions have to be smaller than stylus dimensions
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|Sample dimensions have to be smaller than tip dimensions
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*One 50 mm wafer
*One 50 mm wafer
*One 100 mm wafer  
*One 100 mm wafer  
:(not possible to inspect entire wafer in JEOL SEM)
:(not possible to inspect entire wafer in JEOL-SEM)
*One 150 mm wafer  
*One 150 mm wafer  
:(only Zeiss, LEO and FEI, not possible to inspect entire wafer)
:(not JEOL-SEM)
*One 2000 mm wafer  
*One 2000 mm wafer  
:(only Zeiss, LEO and FEI, not possible to inspect entire wafer)
:(only Supra 60VP, not possible to inspect entire wafer)
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*One small sample
*One small sample