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Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions

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Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,331 edits
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|Scanning electron microscope  
|Scanning electron microscope  
([[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Zeiss|SEM Supra 60VP]],  
([[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Zeiss|SEM Supra 60VP]],  
([[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Zeiss|SEM Supra 40VP]], [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/LEO|SEM-LEO]], [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/FEI|SEM-FEI]], [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Jeol|SEM-JEOL]])
[[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Zeiss|SEM Supra 40VP]], [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/LEO|SEM-LEO]], [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/FEI|SEM-FEI]], [[Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/Jeol|SEM-JEOL]])
|Atomic force microscope  
|Atomic force microscope  
(NanoMan)
(NanoMan)
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!Batch size
!Batch size
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|
*Several small samples
*Small samples
*One 50 mm wafer
*One 50 mm wafer
*One 100 mm wafer
*One 100 mm wafer
*One 150 mm wafer
*One 150 mm wafer
*One 200 mm wafer
Stage size depends on what microscope you use
Stage size depends on what microscope you use
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|
*Several small samples
*Small samples
*One 50 mm wafer
*One 50 mm wafer
*One 100 mm wafer
*One 100 mm wafer
*One 150 mm wafer
*One 150 mm wafer
|
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*Several small samples
*Small samples
*One 50 mm wafer
*One 50 mm wafer
*One 100 mm wafer  
*One 100 mm wafer  
:(not possible to inspect entire wafer in JEOL SEM)
:(not possible to inspect entire wafer in JEOL SEM)
*One 150 mm wafer  
*One 150 mm wafer  
:(only Zeiss, LEO and FEI, not possible to inspect entire wafer)
*One 2000 mm wafer
:(only Zeiss, LEO and FEI, not possible to inspect entire wafer)
:(only Zeiss, LEO and FEI, not possible to inspect entire wafer)
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!'''Allowed materials'''
!'''Allowed materials'''
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*All sample materials (non-contact measurements)
*All standard cleanroom materials (optical measument)
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*All sample materials (non-contact measurements)
*All standard cleanroom materials (optical measurement)
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*All sample materials, expect:  
*All sample materials, expect:  
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:(Use low vacuum detector in SEM-FEI or VPSE detector in SEM-Zeiss)
:(Use low vacuum detector in SEM-FEI or VPSE detector in SEM-Zeiss)
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*All sample materials, except samples that might stick to the tip.
*All standard cleanroom materials, except samples that might damage or stick to the tip.
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*All sample materials, expect samples that might stick to the tip.
*All standard cleanroom materials, expect samples that might damage or stick to the tip.
*III-V samples:
:(Use the III-V profiler)
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|-
|}
|}
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