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Specific Process Knowledge/Characterization/Profiler: Difference between revisions

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!style="background:silver; color:black;" align="left"|Purpose  
!style="background:silver; color:black;" align="left"|Purpose  
|style="background:LightGrey; color:black"|Film thickness measurements and optical characterization of optically transparent thin films||style="background:WhiteSmoke; color:black"|
|style="background:LightGrey; color:black"|Profiler for measuring micro structures. Can do wafer mapping and stress measurements.||style="background:WhiteSmoke; color:black"|
*Measurement of (multi layer) film thickness (only one unknown layer)
*Single point profiles
*Optical constants
*Wafer mapping
*Stress measurements by measuring wafer bow
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!style="background:silver; color:black" align="left"|Performance
!style="background:silver; color:black" align="left"|Performance
|style="background:LightGrey; color:black"|Thin film materials that can be measured||style="background:WhiteSmoke; color:black"|
|style="background:LightGrey; color:black"|Scan range xy||style="background:WhiteSmoke; color:black"|
Any film that is transparent to the light in the given wavelength range
Any film that is transparent to the light in the given wavelength range
ex:
Line scan x: 50 µm to 200 mm
*Silicon Oxide
*Silicon nitride
*PolySilicon
*Photoresists
*SU8
*Other polymers
*Very thin layers of metals (<20 nm)
*and many more
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|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Film thickness range
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Scan range z
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*~20Å to 2 µm (depending of the material)
50 Å to 262 µm
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!style="background:silver; color:black" align="left"|Process parameter range
|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution xy
|style="background:LightGrey; color:black"|Wavelength range
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*300-950 nm
down to 0.067 µm
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|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution z
|style="background:WhiteSmoke; color:black"|
1Å, 10Å or 20Å
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|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W
|style="background:WhiteSmoke; color:black"|
1.2(W[µm]-5µm)
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!style="background:silver; color:black" align="left"|Hardware settings
|style="background:LightGrey; color:black"|Tip radius
|style="background:WhiteSmoke; color:black"|
*5 µm 60<sup>o</sup> cone
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!style="background:silver; color:black" align="left"|Substrates
!style="background:silver; color:black" align="left"|Substrates
|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*One sample at a time - all sample larger than  about 1x1 cm<sup>2</sup>sizes up to about 6"
*up to 8"
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|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed
|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed
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