Specific Process Knowledge/Characterization/Profiler: Difference between revisions
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!style="background:silver; color:black;" align="left"|Purpose | !style="background:silver; color:black;" align="left"|Purpose | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|Profiler for measuring micro structures. Can do wafer mapping and stress measurements.||style="background:WhiteSmoke; color:black"| | ||
* | *Single point profiles | ||
* | *Wafer mapping | ||
*Stress measurements by measuring wafer bow | |||
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!style="background:silver; color:black" align="left"|Performance | !style="background:silver; color:black" align="left"|Performance | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|Scan range xy||style="background:WhiteSmoke; color:black"| | ||
Any film that is transparent to the light in the given wavelength range | Any film that is transparent to the light in the given wavelength range | ||
Line scan x: 50 µm to 200 mm | |||
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|style="background:silver; color:black"|.||style="background:LightGrey; color:black"| | |style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Scan range z | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
50 Å to 262 µm | |||
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|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution xy | |||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | down to 0.067 µm | ||
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|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Resolution z | |||
|style="background:WhiteSmoke; color:black"| | |||
1Å, 10Å or 20Å | |||
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|style="background:silver; color:black"|.||style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W | |||
|style="background:WhiteSmoke; color:black"| | |||
1.2(W[µm]-5µm) | |||
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!style="background:silver; color:black" align="left"|Hardware settings | |||
|style="background:LightGrey; color:black"|Tip radius | |||
|style="background:WhiteSmoke; color:black"| | |||
*5 µm 60<sup>o</sup> cone | |||
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!style="background:silver; color:black" align="left"|Substrates | !style="background:silver; color:black" align="left"|Substrates | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|Substrate size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | *up to 8" | ||
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|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed | |style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed |
Revision as of 11:09, 7 January 2008
Dektak 8 stylus profiler
Dektak 8 stylus profiler is a product of Veeco Instruments. It is usable for profiling surfaces of samples with structures in the micrometer range. It can measure in a specific point found with help from high magnification video cameras or it can be programmed to measure several points defined with respect to some deskew points. It can also be used for stress measurements of thin films by measuring the wafer bow.
To get some product information and some tips and tricks from the vendor take a look at Veeco's homepage [1]
A rough overview of the performance of Dektak 8 stylus profiler
Purpose | Profiler for measuring micro structures. Can do wafer mapping and stress measurements. |
|
---|---|---|
Performance | Scan range xy |
Any film that is transparent to the light in the given wavelength range Line scan x: 50 µm to 200 mm |
. | Scan range z |
50 Å to 262 µm |
. | Resolution xy |
down to 0.067 µm |
. | Resolution z |
1Å, 10Å or 20Å |
. | Max. scan depth as a function of trench width W |
1.2(W[µm]-5µm) |
Hardware settings | Tip radius |
|
Substrates | Substrate size |
|
. | Substrate material allowed |
|