Specific Process Knowledge/Etch/Etching of TOPAS: Difference between revisions
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! Parameter | ! Parameter | ||
! TOPAS etch | ! Slow TOPAS etch | ||
! Fast TOPAS etch | |||
|- | |- | ||
! O<sub>2</sub> (sccm) | ! O<sub>2</sub> (sccm) | ||
| 50 | |||
| 99 | | 99 | ||
|- | |- | ||
! CO<sub>2</sub> (sccm) | ! CO<sub>2</sub> (sccm) | ||
| 50 | |||
| 0 | | 0 | ||
|- | |- | ||
! Pressure (mTorr) | ! Pressure (mTorr) | ||
| 40 | |||
| 40 | | 40 | ||
|- | |- | ||
! Coil power (W) | ! Coil power (W) | ||
| 800 | |||
| 720 | | 720 | ||
|- | |- | ||
! Platen power (W) | ! Platen power (W) | ||
| 60 | |||
| 60 | | 60 | ||
|- | |- | ||
! Temperature (<sup>o</sup>C) | ! Temperature (<sup>o</sup>C) | ||
| 20 | |||
| 20 | | 20 | ||
|- | |- | ||
! Etch rate (nm/min) | ! Etch rate (nm/min) | ||
| ~350 | |||
| ~500 | | ~500 | ||
|- | |||
!Center-Edge uniformity | |||
| 0.98 | |||
| 0.95 | |||
|} | |} | ||