Specific Process Knowledge/Etch/Etching of SU-8: Difference between revisions
| Line 59: | Line 59: | ||
{| border="1" cellspacing="1" cellpadding="2" align="left" | {| border="1" cellspacing="1" cellpadding="2" align="left" | ||
! SU-8 lines by lithography | |||
! Oxygen etch | ! Oxygen etch | ||
! SU8aniso | ! SU8aniso | ||
! SU8iso | ! SU8iso | ||
|- | |- | ||
|[[Image:SU8-noetch Q13.jpg|200x200px]] | |||
|[[Image:SU8-oxygen-etch_Q12.jpg|200x200px]] | |[[Image:SU8-oxygen-etch_Q12.jpg|200x200px]] | ||
|[[Image:SU8-SU8aniso_R15.jpg|200x200px]] | |[[Image:SU8-SU8aniso_R15.jpg|200x200px]] | ||
|[[Image:SU8-SU8iso_R13.jpg|200x200px]] | |[[Image:SU8-SU8iso_R13.jpg|200x200px]] | ||
|- | |- | ||
|No etching | |||
|Etch | |Etch | ||
*O<sub>2</sub> flow [sccm]:99 | *O<sub>2</sub> flow [sccm]:99 | ||