Specific Process Knowledge/Etch/Etching of SU-8: Difference between revisions

@@ Line 66: / Line 66: @@
 |[[Image:SU8-SU8aniso_R15.jpg|200x200px]]
 |[[Image:SU8-SU8iso_R13.jpg|200x200px]]
+|-
+|Etch
+*O<sub>2</sub> flow [sccm]:99
+*SF<sub>6</sub> flow [sccm]:0
+*Pressure [mTorr]:20
+*Coil power [W]:800
+*Platen power [W]:30
+*Temperature [°C]:10
+|Etch
+*O<sub>2</sub> flow [sccm]:99
+*SF<sub>6</sub> flow [sccm]:0
+*Pressure [mTorr]:20
+*Coil power [W]:800
+*Platen power [W]:30
+*Temperature [°C]:10
+|Etch
+*O<sub>2</sub> flow [sccm]:99
+*SF<sub>6</sub> flow [sccm]:0
+*Pressure [mTorr]:20
+*Coil power [W]:800
+*Platen power [W]:30
+*Temperature [°C]:10
 |}