Specific Process Knowledge/Etch/Etching of SU-8: Difference between revisions
Created page with "SU-8 can be etched by a oxygen plasma with a small amount of SF6 to remove the antimony present from the photo initiator." |
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SU-8 can be etched by a oxygen plasma with a small amount of | SU-8 can be etched by a oxygen plasma with a small amount of SF<sub>6</sub> to remove the antimony present from the photo initiator. | ||
Revision as of 15:24, 1 November 2013
SU-8 can be etched by a oxygen plasma with a small amount of SF6 to remove the antimony present from the photo initiator.