Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions
| Line 69: | Line 69: | ||
!Vertical resolution | !Vertical resolution | ||
| | | | ||
| | |Cofocal measurements: | ||
10x objective: <50 nm | |||
50x objective, NA 0.95: <1 nm | |||
Interference measurements: | |||
PSI: 0.01 nm | |||
VSI: 1 nm | |||
|1-20 nm | |1-20 nm | ||
depends on what SEM you use | depends on what SEM you use | ||
| Line 80: | Line 85: | ||
!Horizontal resolution | !Horizontal resolution | ||
| | | | ||
| | |Three times pixel-to-pixel distance: | ||
10x objective: 4.95 &mu | |||
100x objective: 0.495 &mu | |||
|1-20 nm | |1-20 nm | ||
depends on what SEM you use | depends on what SEM you use | ||