Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Matching: Difference between revisions
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:Last Friday I ran the first nanoetches with the recipe below - with limited success however. I was short on time so I couldn't investigate it further but for some reason the coil power would rise to some 1500 W in the first few seconds of the etch and og out of tolerance. I tried switching to forward power, no success. I copied a switched recipe and adjusted all the parameters that I know to change and switched to continuous tolerance recipe. What about matching, wouldn't it be good idea to try and run the process manually (ramping up RF powers and allowing the matching network to stabilize and setting the load/tune parameters as starting points?) and I don't need to strike the plasma...? | :Last Friday I ran the first nanoetches with the recipe below - with limited success however. I was short on time so I couldn't investigate it further but for some reason the coil power would rise to some 1500 W in the first few seconds of the etch and og out of tolerance. I tried switching to forward power, no success. I copied a switched recipe and adjusted all the parameters that I know to change and switched to continuous tolerance recipe. What about matching, wouldn't it be good idea to try and run the process manually (ramping up RF powers and allowing the matching network to stabilize and setting the load/tune parameters as starting points?) and I don't need to strike the plasma...? | ||