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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using LPCVD TEOS: Difference between revisions

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==B2 Furnace LPCVD TEOS==
==B2 Furnace LPCVD TEOS==
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Oxide/Deposition_of_Silicon_Oxide_using_LPCVD_TEOS click here]'''
[[Image:teos1.jpg|300x300px|thumb|Figure 1: TEOS structure]]
[[Image:teos1.jpg|300x300px|thumb|Figure 1: TEOS structure]]
[[Image:teos2.JPG|300x300px|thumb|Figure 2: TEOS deposited in a trench etched in Silicon]]
[[Image:teos2.JPG|300x300px|thumb|Figure 2: TEOS deposited in a trench etched in Silicon]]
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