Specific Process Knowledge/Thin film deposition: Difference between revisions
| Line 112: | Line 112: | ||
*sccm | *sccm | ||
| | | | ||
* | *[[/Deposition of TiW|TiW]] alloy (10%/90% by weight) | ||
* | *[[/Deposition of NiCr|NiCr]] alloy | ||
*[[/Deposition of AlTi|AlTi]] alloy | |||
| | | | ||
*sdfg | *sdfg | ||