Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE process trends: Difference between revisions
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=Some general process trends= | =Some general process trends= | ||
This page is supposed to gather some general process trends and good advise for designing IBE recipes. So far these trends has been developed etching Si with resist as masking material and by etcing some multilayered films. The work has been done by ''Kristian Hagsted Rasmussen @ Nanotech'' | This page is supposed to gather some general process trends and good advise for designing IBE recipes. So far these trends has been developed etching Si with resist as masking material and by etcing some multilayered films. The work has been done by ''Kristian Hagsted Rasmussen @ Nanotech'' | ||
Revision as of 09:35, 11 October 2013
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Some general process trends
This page is supposed to gather some general process trends and good advise for designing IBE recipes. So far these trends has been developed etching Si with resist as masking material and by etcing some multilayered films. The work has been done by Kristian Hagsted Rasmussen @ Nanotech
Etch rate
| Etch rate | Parameters |
|---|---|
| increases with | Beam current |
| increases with | Beam voltage |
| increases with | Beam current * Beam voltage |
| not significantly effected by | Stage angle |
| not significantly effected by | Accelerator voltage |
Etch profile
| Etch profile (goal 90dg) | Parameters |
|---|---|
| improves with | Low stage angle (optimum around 5-10 dg) |
| is effected by | Beam current (low I(B)(400mA) better than high I(B)(600mA)) |
| is effected by | Accelerator voltage * Stage angle |
| not significantly effected by | Beam voltage |
Rotation speed
The rotation is activated to get a good uniformity over the wafer. The minimum number of rotation to get a good uniformity is 100 rotation for the hole etch. the maximum rotation speed is 20rpm. That means that an etch shorter that 5min cannot obtain a very good uniformity.
| Etch Length [min] | 5 | 6 | 7 | 8 | 9 | 10 | 15 | 20 | 25 | 34 | 50 | 100 |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Minimum rotation speed [rpm] | 20 | 17 | 15 | 13 | 12 | 10 | 7 | 5 | 4 | 3 | 2 | 1 |