Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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==Manual Spinner 1 (Laurell)== | ==Manual Spinner 1 (Laurell)== | ||
[[Image:IMG_1175.jpg|200 × 200px|thumb|right|The Manual Spinner1 (Laurell): positioned in Cleanroom 13.]] | |||
'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Manual_Spinner_1_(Laurell) click here]''' | |||
Manual Spinner 1, WS-650 model, from Laurell is a resist spinning coater at Danchip which can be used for spinning on whole 2", 4" and 6" substrates and also a small pieces. | |||
The system can be used for spinning all resists, but remember to clean the spinner with an appropriate solvents, which can remove the resist residues. | |||
'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=315 LabManager]''' | '''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=315 LabManager]''' | ||