Specific Process Knowledge/Etch/KOH Etch: Difference between revisions
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image:KOH_4tommer.jpg|KOH etch for 4" wafers. KOH1 to the left and KOH2 to the right, in between you find the BHF tank. Positioned in cleanroom 3. | image:KOH_4tommer.jpg|KOH etch for 4" wafers. KOH1 to the left and KOH2 to the right, in between you find the BHF tank. Positioned in cleanroom 3. | ||
image:KOH_fumehood.JPG|KOH_fumehood is positioned in cleanroom 2. This is used for wafers that are considered dirty.</gallery> | image:KOH_fumehood.JPG|KOH_fumehood is positioned in cleanroom 2. This is used for wafers that are considered dirty.</gallery> | ||
'''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:''' | |||
<!-- remember to remove the type of documents that are not present --> | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=248 KOH3 info page in LabManager], | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=49 KOH2 info page in LabManager], | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=9 KOH1 info page in LabManager], | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=197 Fumehood KOH info page in LabManager] | |||
Key facts for the different etch baths available at Danchip are resumed in the table: | Key facts for the different etch baths available at Danchip are resumed in the table: | ||