Specific Process Knowledge/Thermal Process/A1 Bor Drive-in furnace: Difference between revisions
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==Boron Drive-in furnace (A1)== | ==Boron Drive-in + Pre-dep furnace (A1)== | ||
[[Image:A1.JPG|thumb|300x300px|A1 | [[Image:A1.JPG|thumb|300x300px|A1 Boron Drive-in + Pre-dep furnace. Positioned in cleanroom 2]] | ||
The Boron Drive-in furnane (A1) is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide, drive-in of boron after a pre-deposition and oxidation of the boron phase layer. Boron pre-deposition takes place in the | The Boron Drive-in + Pre-dep furnane (A1) is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide, drive-in of boron after a pre-deposition and oxidation of the boron phase layer. Boron pre-deposition takes place in the same furnace. The Boron Drive-in furnace can also be used for drive-in of boron which has been ion implanted. | ||
The Boron Drive-in furnace is the top furnace tube in the A-stack positioned in cleanroom 2. The A-stack | The Boron Drive-in + Pre-dep furnace is the top furnace tube in the A-stack positioned in cleanroom 2. The A-stack are the cleanest of all furnaces in the cleanroom. Please be aware of which substrates that are allowed to enter this furnace. Check [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 the cross contamination chart]. | ||
'''The user manual, quality control instruction and results, technical information and contact information can be found in LabManager:''' | '''The user manual, quality control instruction and results, technical information and contact information can be found in LabManager:''' | ||