Specific Process Knowledge/Etch/KOH Etch: Difference between revisions
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<gallery caption="Different places to do anisotropic wet silicon etch" widths="300px" heights="200px" perrow="3"> | <gallery caption="Different places to do anisotropic wet silicon etch" widths="300px" heights="200px" perrow="3"> | ||
image:KOH3_RR4_1.JPG| | image:KOH3_RR4_1.JPG|KOH3 bench for etch of 4" and 6" wafers. Positioned in cleanroom 4. | ||
image:KOH_4tommer.jpg|KOH etch for 4" wafers. KOH1 to the left and KOH2 to the right, in between you find the BHF tank. Positioned in cleanroom 3. | image:KOH_4tommer.jpg|KOH etch for 4" wafers. KOH1 to the left and KOH2 to the right, in between you find the BHF tank. Positioned in cleanroom 3. | ||
image:KOH_fumehood.JPG|KOH_fumehood is positioned in cleanroom 2. This is used for wafers that are considered dirty.</gallery> | image:KOH_fumehood.JPG|KOH_fumehood is positioned in cleanroom 2. This is used for wafers that are considered dirty.</gallery> | ||