Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
No edit summary |
No edit summary |
||
| Line 134: | Line 134: | ||
<br clear="all" /> | <br clear="all" /> | ||
<gallery caption="Different places to do wet silicon oxide etch" widths="250px" heights="300px" perrow="4"> image: | <gallery caption="Different places to do wet silicon oxide etch" widths="250px" heights="300px" perrow="4"> image:BHF clean RR3.jpg|BHF clean in Cleanroom3. Wet silicon oxide etch bath positioned to the left in the bench. | ||
image:KOH_4tommer.jpg|BHF in Cleanroom3 (KOH bench 1+2.) The BHF bath is positioned between the two KOH baths. This is primarily used to remove oxide before and after a KOH etch. | image:KOH_4tommer.jpg|BHF in Cleanroom3 (KOH bench 1+2.) The BHF bath is positioned between the two KOH baths. This is primarily used to remove oxide before and after a KOH etch. | ||
image:BHF-PolySi-Al Etch.jpg|SIO etch bath(BHF with wetting agent) are positioned to the left in the bench in cleanroom 4. | image:BHF-PolySi-Al Etch.jpg|SIO etch bath(BHF with wetting agent) are positioned to the left in the bench in cleanroom 4. | ||