Specific Process Knowledge/Etch/Wet Polysilicon Etch: Difference between revisions
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==Wet PolySi Etch== | ==Wet PolySi Etch== | ||
[[Image:BHF-PolySi-Al-etch.jpg|300x300px|thumb|Wet PolySilicon Etch (in the middle): positioned in cleanroom 4]] | [[Image:BHF-PolySi-Al-etch.jpg|300x300px|right|thumb|Wet PolySilicon Etch (in the middle): positioned in cleanroom 4]] | ||
The wet PolySi Etch is an isotropic silicon etch. This holds for both a poly-silicon thin-film as well as single-crystalline material such as a Si(100) surface. The PolySi Etch process is placed in a dedicated PP-tank in a laminar-flow bench in cleanroom 4. | The wet PolySi Etch is an isotropic silicon etch. This holds for both a poly-silicon thin-film as well as single-crystalline material such as a Si(100) surface. The PolySi Etch process is placed in a dedicated PP-tank in a laminar-flow bench in cleanroom 4. | ||