Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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The table describes the e-beam resist used in the cleanroom for standard e-beam exposure. Some of resists are not provided by DTU Danchip and some are not yet approved for common use in the cleanroom and are currently being tested. If you wish to test some of these resists or other resists, please contact [mailto:lithography@danchip.dtu.dk Lithography]. | The table describes the e-beam resist used in the cleanroom for standard e-beam exposure. Some of resists are not provided by DTU Danchip and some are not yet approved for common use in the cleanroom and are currently being tested. If you wish to test some of these resists or other resists, please contact [mailto:lithography@danchip.dtu.dk Lithography]. | ||
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