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Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Etchant  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Etchant  
|style="background:WhiteSmoke; color:black"|<b>BHF</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Etch/Wet_Silicon_Oxide_Etch_(BHF)#Comparing_different_BHF_baths|BHF]]</b>
|style="background:WhiteSmoke; color:black"|<b>5% HF</b>
|style="background:WhiteSmoke; color:black"|<b>5% HF</b>
|style="background:WhiteSmoke; color:black"|<b>40% HF</b>
|style="background:WhiteSmoke; color:black"|<b>40% HF</b>
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==Life time of the photoresist and blue film in BHF==
==Life time of the photoresist and blue film in BHF==
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/Wet_Silicon_Oxide_Etch_(BHF)"