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Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Au etch: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
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|-style="background:silver; color:black"
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![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|Ti etch test with Zep520A as mask - To etch the Ti mask]]
!Ti etch test with Zep520A as mask - To etch the Ti mask
![[Specific Process Knowledge/Thin film deposition/PECVD|Au etch test with high selectivity to Ti]]
!Au etch test with high selectivity to Ti
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*A
*A
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|-style="background:silver; color:black"
!Results
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